STA1200 Slideable Multi Zone PECVD vacuum tube Furnace with 4 Channel Gas system WELCOME TO ZHENGZHOU STA UNIVERSE GROUP CO,. LTD CONTACT ABOUT US 24 hours service hotline STA Universe Home.
CVD Tube Furnace full name is Chemical Vapor Deposition Tube Furnace, which are designed with a vertically stand chamber with fixed well tube reactor to do quenching tests for wire shape materials under vacuum or atmosphere protection in lab and industrial. Features cylindrical chamber or two semi-cylindrical chambers lining with high alumina.
Laboratory 1200°C CVD Tube Furnace with 4 Channel MFC Gas Mixer and Vacuum Pump CY-O1200-60IT-4Z10V. CY-O1200-60IT-4Z10V is a CE certified splittable single zone tube.
2014/03/02 · OTF-1200X-PEC4LV is acompact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of 300W RF plasma source, 2" or 3.14" O.D.
CVD tube furnace. Description: CVD tube furnace is widely used for various CVD experimental reaction temperature at 1200 ℃, it can also be used for vacuum sintering,vacuum.
1400c Cvd Grow Machine Instrument Tube Furnace 1200c For Sio2 Si3n4 Sic Coating , Find Complete Details about 1400c Cvd Grow Machine Instrument Tube Furnace 1200c For Sio2 Si3n4 Sic Coating,Cvd Instrument,Cvd Grow Machine,1400cc Cvd Tube Furnace 1200 Oc from Laboratory Heating Equipments Supplier or Manufacturer-Henan Dming Technology Co., Ltd.
CVD graphene growing CVD furnace machine system / crystal growing furnace / nanowire growing furnace, US $ 1800 - 12863 / Set, Laboratory Heating Equipments, kejia, KJ-1200C-II-CVD system.Source from Zhengzhou Kejia Furnace Co., Ltd. on Alibaba.com.
Compact CVD furnace system with: 4.33" O.D x 4.05" I.D x 29.13" Length quartz tube. 1100ºC Max. working temperature. The water cooling flange on the right side is slidable for easy.
OTF-1200X-II-50-PEMSL is a dual-zone PE-CVD tube furnace system which consists of 300W RF plasma source Facebook Phone (+65) 6284 3818 Email [email protected] Enquriy.
2022/08/18 · Description. STF1200 series Chemical Vapor Deposition (CVD) and Plasma-Enhanced Chemical Vapor Deposition (PECVD) multi-zone split tube furnaces feature the.
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CVD tube furnace. Description: CVD tube furnace is widely used for various CVD experimental reaction temperature at 1200 ℃, it can also be used for vacuum sintering,vacuum protective atmosphere sintering nanomaterials preparation,battery materials preparation and other research field. 2.To be input inert gas, hydrocarbon gas,hydrogen.
2014/03/02 · OTF-1200X-PEC4LV is acompact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of 300W RF plasma source, 2" or 3.14" O.D optional split tube furnace 1200C Max. PECVD Split Tube Furnace (2" - 3.14" OD) w/ 4 Channels Gas Delivery & Vacuum Pump - OTF-1200X-PEC4LV.
Detailed Parameters Of The Product. CVD tube furnace is widely used for various CVD experimental reaction temperature at 1200 ℃, it can also be used for vacuum sintering,vacuum.
Deposition Thin Films or Grow Nanowire Used PE-CVD Tube Furnace System Upto 1200c(id:). View product details of Deposition Thin Films or Grow Nanowire Used.
Deposition Thin Films or Grow Nanowire Used PE-CVD Tube Furnace System Upto 1200c(id:). View product details of Deposition Thin Films or Grow Nanowire Used PE-CVD Tube Furnace System Upto 1200c from Zhengzhou TCH.
Laboratory PECVD Split Tube Furnace (1200c) with three zone tube furnace for deposit thin films or grow nanowire, US $ 10000 - 22000 / Set, 1 YEAR, Laboratory Heating Equipments, OEM.Source from Zhengzhou TCH Instrument Co., Ltd. on Alibaba.com.