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2009/01/01 · Request PDF | On Jan 1, 2009, P.I. Widenborg and others published High rate 13.56 MHz PECVD a-Si:H for SPC poly-Si thin film solar cells | Find, read and cite all the research.
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Semantic Scholar extracted view of "High Rate 13.56 MHz PECVD a-Si:H for SPC Poly-Si Thin Film Solar Cells" by S. Varlamov et al. DOI: 10.4229/24THEUPVSEC2009-3CO.6.1 Corpus.
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1 Introduction Plasma-enhanced chemical vapor deposition (PECVD) of thin film silicon is a key process in various industrial applications. Thin film silicon material is used in flat panel displays.
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layers. L1 is the inductance of layer 1 spiral, and L2 the inductance of spiral on layer 2. Figure 5. Diagram form of a double layer antenna L1 and L2 are connected in series and coupled.
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The three main ranges of plasma are 40 kHz, 13.56 MHz, and 2.45 GHz. 40 kHz is the lowest of the Plasma Frequencies. Though it may sound the weakest, a low frequency can make the biggest difference in quality. At 40 kHz, there is the highest ion density of the three main frequencies meaning that there will be more particles of the plasma per.
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