Product description：. PT-PECVD is a splitable tube furnace with 60mm diameter size quartz tube, vacuum pump and 4channels mass flow meters gas flowing system. It can mix 1-4.
No vacuum condition is allowed when the temperature is higher than 1000 . Please keep the gas flow lower than 200sccm when the temperature is high to lower the impact of cold air to the hot tube. If you have to keep the valves on the two ends of the tube closed at the same time, please watch the pressure gauge and open the valves once the pressure is higher than 1.02Mpa to.
High Temperature Tube Furnace System. Application : High pressure 1600 ℃ vacuum tube furnace, with the possibility of working under atmospheres and under vacuum using inert.
Roll to roll PEVCD is a roll-to-roll tubular furnace system for graphene preparation. The equipment consists of coil to coil copper foil rewinding and placing sealing device, 1200°C tube furnace with three temperature zones and vacuum unit. It can be used for large-scale growth of high quality graphene and other two-dimensional materials.
2021/12/29 · 1200℃ PECVD Tube Furnace Standard specification: 1. Heating System. 50 programmable segments for precise control of heating rate, cooling rate and dwell time. Built in PID Auto-Tune function with overheating & broken thermocouple broken protection. PLC automatic control system by PC controller inside.
1200℃ PE-HPCVD Rotary Furnace with In-situ Evaporator, 4 Channel MFC and Vacuum Pump. 1200℃ Max. Slidable Multi Zone PECVD Furnace. 1 2 next Last.
CVD series products selected by Kejia Electric Furnace are mainly classified into low vacuum CVD system, chemical vapor deposition equipment, graphene growth furnace, plasma enhanced CVD system, graphene carbon nanotube.
Stainless Steel vacuum flange with valves and needles. Power source. 380V, 50 Hz, 3P at max. 11KW. Vacuum Pump System. Vacuum Pump Group. (rotary vane pump+diffussion pump).
High Temperature Vacuum Tube Furnace Growing Graphene Preparation Pecvd System , Find Complete Details about High Temperature Vacuum Tube Furnace Growing Graphene.
PECVD system Application: Wide temperature range; long sputtering area; adjustable tube; exquisite and compact, cost-effective, can achieve rapid temperature rise and fall, is an ideal.
Description： PECVD system Graphene Growth Furnace is widely used for various CVD experimental reaction temperature at 1600 ℃, it can also be used for vacuum sintering,vacuum protective atmosphere sintering nanomaterials preparation,battery materials preparation and other research field. 2.To be.
Furnace tube material High purity quartz Furnace tube size Dia. 50x800mm Sealing method Vacuum stainless steel flange, KF16 flange Adjustable speed 0-20rpm Furnace tilt angle 0-15 Vacuum pump Rotary vane mechanical 1.
Graphene Preparation PECVD Equipment Application : PT-T1200-S60LC-H2 graphene preparation machine is composed of PT-T1200 open slide rail tube furnace, vacuum.
Description： PECVD system Graphene Growth Furnace is widely used for various CVD experimental reaction temperature at 1600 ℃, it can also be used for vacuum.
Model KJ-OTF-1700-80*220*3-F4 Heatings system Display LED Limit Temperature 1700 Continuous Working Temp. ≤1600 Heating Rate Suggestion: 0~15 /min (max. 20 /min) Temperature Zone Num 3 Length for each zone.
Technical parameters of PECVD furnace : Tube furnace. · Input power: 208 – 240V AC, 1.2kW. · 1200°C Max. working temperature for < 60 minutes. · 1100°C Max for continuous heating. ·.
PECVD System. PT-T1200 PECVD Tube Furnace System. High vacuum rotating tilt pecvd system. Compact Auto PECVD Furnace. Graphene Preparation PECVD Equipment. PECVD.
PT high vacuum PECVD system is composed of tube furnace, vacuum system, gas supply system, radio frequency power supply system, etc. The system is mainly used in the growth.
High Temperature CVD Tube Furnace System High vacuum three zone tube furnace for graphene, 2D material and other coating application Sliding double furnace tube furnace Kejia KJ-T1200 Double Zones CVD System 1 2 next.
Evaporation equipment. Roll to roll pecvd system for constant graphene film production RTR-III-80. Experimental level sublimation instrument BOF-5-50. RTP vertical quenching furnace RTP-1200C-BVT-80. OLED Vacuum mixing and homogenizing system BTF-1200C-RF-II-210.