laboraory mini PECVD system with mini tube furnace for film depostion, US $ 4000 - 10000 / Set, 1 YEAR, Laboratory Heating Equipments, OEM.Source from Zhengzhou TCH Instrument.
Laboratory Pecvd Tube Furnace System For Siox,Sinx,Sioxny And Amorphous Silicon (a-si:h) Deposition , Find Complete Details about Laboratory Pecvd Tube Furnace System For.
3 Temperature Zone Sliding PECVD Tube Furnace. 1200℃ Dual Zones Sliding PECVD System. Mini Single Temperature Zone Sliding PECVD Tube Furnace. RF Generator for 50, 80 or 125 mm OD Tube Furnace. Laboratory 1200C Max. Two Zone High Temperature PECVD Tube Furnace (Optional Tube Dia) with Auto- Sliding.
Single-zone Tube Furnace. (200 ~2000°C) Multi-zone Tube Furnace. (2 ~ 7 zone) Rotary Tube Furnace. (1 - 3 zone ) Vertical Tube Furnace. Tube Furnace with Vacuum & Gas Delivery System. CVD & PECVD Tube Furnace.
PECVD-500A/PECVD-S-150A. CVD with sliding furnace for graphene production. Two Channels ALD Tube Furnace System. Roll to roll pecvd system for constant graphene film production. Large-diameter dynamic plasma assisted roll-to-roll graphene preparation equipment. Plasma Enhanced Roll to Roll Chemical Vapor Deposition System for graphene production.
2021/12/29 · 1200℃ PECVD Tube Furnace Standard specification: 1. Heating System. 50 programmable segments for precise control of heating rate, cooling rate and dwell time. Built in.
Description of the PECVD tube furnace system: CY-OCLV-PE (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of 500W RF plasma source, 2" or 3.14" O.D optional split tube furnace, 4 channels precision mass flow meter with gas mixing tank, and high quality mechanical pump.
Pecvd Tube Furnace With Roll To Roll System For Depositing Semiconductor Research , Find Complete Details about Pecvd Tube Furnace With Roll To Roll System For Depositing.
This CVD system is specially designed for graphene production, using a 1200 mini tube furnace, equipped with a high-precision mass flow meter and a thin-film vacuum gauge..
This set CVD equipment is a miniaturized CVD system, the core of which is a mini tube furnace, which uses resistance wire heating, and the maximum temperature of the equipment can reach 1200℃. The instrument also contains a three-channel float flow meter and a molecular pump set, which respectively constitute the inlet and outlet gas parts of.
1500 Max.Three Zone PECVD System w/ 80 mm Processing Tube Three Zones Tube Furnace (4") with Vacuum Pump (1.0E-4 torr) + 9 Channel Digital Gas Flow-meters for Compact Auto-Sliding PECVD Tube Furnace with 2" OD Quartz Tube and Vacuum Pump, Max. 1200℃C.
CY-O1200-50IS-PECVD is a CE certified splittable single zone tube furnace with 60mm diameter quartz tube, mechanical vacuum pump and four channel gas flowing system and a 13.56MHz.
Technical parameters of PECVD furnace : Tube furnace. · Input power: 208 – 240V AC, 1.2kW. · 1200°C Max. working temperature for < 60 minutes. · 1100°C Max for continuous heating. · High purity quartz tube 2"OD x 1.7"ID x 39.4" Length. · 30 segments programmable precision digital temperature controller.
Lab Scale Elastomeric Material Pyrolysis Furnace with Hopper and Impingers. PT-T1200-PGEP ultrasonic spray furnace system. 1200C Tube furnace with steam generator. Inclined rotary tube furnace. Special furnace for nanowire growth. Continuous feeding and discharging rotary and tilting tube furnace. 1400℃ Rotary tube furnace. Single Zone CVD.
China Laboraotry Mini Pecvd Furnace with Compact Tube Furnace, RF Generator and Gas Mixer CY-O1200-50IS-PECVD, Find details about China Laboraotry Mini Pecvd Furnace,.
High temperature rotary tube furnace. 1600 ℃ vacuum hot pressing furnace. 1200 open touch screen tube furnace. PT-A1400 Atmosphere Furnace. PT-A1400-4.5L Atmosphere Furnace. PT-T1200 Double Zones CVD System. LCD Touch Screen Mini Tube Furnace. PT-M1200-64L Muffle Furnace. PT-V1400-100 (300) Vertical tube furnace.
1200℃ PE-HPCVD Rotary Furnace with In-situ Evaporator, 4 Channel MFC and Vacuum Pump. 1200℃ Max. Slidable Multi Zone PECVD Furnace. 1 2 next Last.
Pecvd Furnace System With 500w Rf Plasma Generator For Thin Film Deposition Research , Find Complete Details about Pecvd Furnace System With 500w Rf Plasma Generator For.
Model NO.: OTF-1200X-II-PEC4SL Application: School, Lab Customized: Customized Certification: CE, ISO, RoHS Structure: Desktop Material: Aluminum.