1,1100℃ Vacuum Chamber Furnace
PT-1200X-H8 is a compact vacuum furnace. It equips a 7.5" ID x 13.4"L Quartz tube chamber sitting horizontally. Water-cooled stainless steel vacuum flanges with valves are installed to.
2,Compact vacuum crucible furnace for calcining or annealing
Compact vacuum crucible furnace for calcining or annealing semiconductor wafers, US $ 3950 - 5850 / Set, 1 year, Laboratory Heating Equipments, OEM.Source from Zhengzhou CY.
3,1200.C Vertical Vacuum crucible Furnace Quartz crucible
1200.C Vertical Vacuum crucible Furnace Quartz crucible furnace for Calcining ,Melting,Sintering, US $ 1950 - 4999 / Set, 2 years, Laboratory Heating Equipments, OEM, ODM, OBM, Customized according to your requirements.Source from Zhengzhou Sutong Electric Equipment Co., Ltd. on Alibaba.com.
4,Laboratory Vacuum Crucible Furnace for Melting / Quartz
Structure:Vertical Type,Max.Temperature:1200c,Working Temperature:1100c Continuously,Thermocouple:K Type,Temperature Accuracy:+/-1c.
5,Hardening Furnace Manufacturers: Process & Furnaces by
2021/01/04 · > Calcination / Calcining Furnace Keep in touch 70-71, III Phase, Peenya Industrial Area, Bengaluru – +91-80-2839 5101 / 102 +91 92431 12371 +91-80-2839 5103 [email protected] Information Compact Vacuum.
6,Laboratory Vacuum Crucible Furnace for Melting / Quartz
Structure: Vertical Type Max.Temperature: 1200c Working Temperature: 1100c Continuously Thermocouple: K Type Temperature Accuracy: +/-1c Temperature Uniformity: +/-5c.
7,vacuum chamber furnace
CY-1200X-H8 is a CE standard vacuum crucible furnace. It is designed for laboratory calcining and annealing semiconductor wafer under vacuum or various protective gas. It equips a 7.5" ID x 13.4"L Quartz tube chamber sitting horizontally. Water-cooled stainless steel vacuum flanges with valves are.
8,Laboratory Vacuum Crucible Furnace for Calcining and
Laboratory Vacuum Crucible Furnace for Calcining and Annealing Semiconductor Wafer The main circuit of the control part is separated from the control circuit, equipped with air.
9,CE Certified Compact Vacuum Chamber Furnace for calcining
CE Certified Compact Vacuum Chamber Furnace for calcining or annealing semiconductor wafers (up to 6"), US $ 1500 - 7000 / Piece, Laboratory Heating Equipments, Kejia, Vacuum chamber furnace.Source from Zhengzhou Kejia Furnace Co., Ltd. on Alibaba.com.
10,Vertical Vacuum Chamber Furnace with Flange
Vacuum crucible furnace is designed for calcining or annealing semiconductor wafers under vacuum or various other gas atmospheres with a temperature up to 1100 C. Vertical Vacuum Chamber Furnace with Flange - Manufacturer of vacuum tube furnace, muffle furnac.
11,Laboratory Vacuum Crucible Furnace for Calcining and
Laboratory Vacuum Crucible Furnace for Calcining and Annealing Semiconductor Wafer The main circuit of the control part is separated from the control circuit, equipped with air switches and circuit breakers as operating units, which is beneficial for debugging and maintenance and can reliably protect the system from short-circuit and overload.
12,Compact vacuum crucible furnace for calcining or annealing
It is designed for laboratory calcining and annealing semiconductor wafer under vacuum or various protective gas. It equips a 7.5" ID x 13.4"L Quartz tube chamber sitting horizontally. Water-cooled stainless steel vacuum flanges with valves are installed to achieve a vacuum of 10.
13,Laboratory Vacuum Quartz Tube Chamber Furnace For
Laboratory Vacuum Quartz Tube Chamber Furnace For Calcining Or Annealing Semiconductor Wafers Vacuum Crucible Furnace , Find Complete Details about Laboratory.
14,ST-1200VCB Vacuum Crucible Furnace,Atmosphere
ST-1200VCB Vertical Vacuum Box Furnace is a vacuum chamber furnace with 8" diameter x 7" height vertical quartz liner and stainless steel vacuum flange. It is designed for calcining or sintering ceramic material or annealing semiconductor wafer under vacuum or various gas atmosphere up to 1200 o.
15,Laboratory Vacuum Crucible Furnace for Calcining and
Laboratory Vacuum Crucible Furnace for Calcining and Annealing Semiconductor Wafer, Find Details about Vacuum Furnace, Vacuum Tube Furnace from Laboratory Vacuum.
16,Laboratory vacuum electric crucible furnace for calcining or
Laboratory vacuum electric crucible furnace for calcining or annealing semiconductor wafers, US $ 4900 - 5100 / Set, 3 years, One year, Laboratory Heating Equipments,.
17,Compact vacuum crucible furnace for calcining or annealing
It is designed for laboratory calcining and annealing semiconductor wafer under vacuum or various protective gas. It equips a 7.5" ID x 13.4"L Quartz tube chamber sitting horizontally..
18,laboratory vacuum Quartz tube chamber furnace for calcining
laboratory vacuum Quartz tube chamber furnace for calcining or annealing semiconductor wafers VBF-1200X-H8, US $ 1000 - 6000 / Set, 1 year, Laboratory Heating Equipments,.
19,Vacuum crucible heat treatment chamber furnace for calcining
Vacuum crucible heat treatment chamber furnace for calcining or annealing semiconductor wafers (up to 6"), US $ 3500 - 5500 / Set, one year, Laboratory Heating Equipments,.
20,laboratory atmosphere controlled quartz tube Chamber muffle
laboratory atmosphere controlled quartz tube Chamber muffle Furnace used for calcining or annealing semiconductor wafers, US $ 2000 - 8679 / Set, Laboratory Heating Equipments,.
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