2.Technical parameters of 1200C Mini tube furnace : Model PT-1200T Display LED Limit temperature 1200 Working temperature ≤1100 Heating rate Suggestion 0~20 /min Temperature accuracy ±1 Temperature zone Single.
This CVD system is specially designed for graphene production, using a 1200 mini tube furnace, equipped with a high-precision mass flow meter and a thin-film vacuum gauge. Inquire Now Next Product Compared with the conventional Pirani resistance gauge, the reading of the thin film gauge is accurate and not.
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2013/10/15 · In this Account, we focus on our recent progresses toward the controlled surface growth of graphene and its two-dimensional (2D) hybrids via rational designs of CVD elementary processes, namely, process engineering. A typical CVD process consists of four main elementary steps: (A) adsorption and catalytic decomposition of precursor gas, (B.
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Detailed Parameters Of The Product. CVD tube furnace is widely used for various CVD experimental reaction temperature at 1200 ℃, it can also be used for vacuum sintering,vacuum protective atmosphere sintering nanomaterials preparation,battery materials preparation and other research field. 2.To be input inert gas, hydrocarbon gas,hydrogen. 3.Max.
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Mini Tube Furnace ,solar cell research Small PVD coating machine / tube furnace for CVD/PECVD/PLCVD manufacturer, US $ 999 - 999 / Set, Laboratory Heating Equipments, CYKY, CY-1200X-S50-2F.Source from Zhengzhou.
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This set CVD equipment is a miniaturized CVD system, the core of which is a mini tube furnace, which uses resistance wire heating, and the maximum temperature of the equipment can reach 1200℃. The instrument also contains a three-channel float flow meter and a molecular pump set, which respectively constitute the inlet and outlet gas parts of.
Laboratory Mini CVD Tube Furnace with Three 3 Gas Way, Mini Tube Furnace Solar Cell Research CVD Growth of Graphene, CVD Vacuum Furnace Product Specification PH3010 is graphene production furnace with nitrogen purging system.